Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/35858
Title: Growth and Characterization of Nickel Oxide Thin Films and Nanostructures for Novel Device Applications
Authors: REN YI
Keywords: Nickel Oxide, Thin Film, Nanostructure, Growth, Electrochromics, Resistive Memory
Issue Date: 21-Aug-2012
Source: REN YI (2012-08-21). Growth and Characterization of Nickel Oxide Thin Films and Nanostructures for Novel Device Applications. ScholarBank@NUS Repository.
Abstract: In this dissertation, the growth and characterization of nickel oxide (NiO) for various novel device applications are investigated. In the aspect of growth, both solution-based and physical deposition methods were employed. Importantly, the Kirkendall effect was examined in detail and this was shown to be especially critical in growing NiO nanostructures. The roughening effect on oxidation to form NiO nanowires was explained together, with the interplay of vacancy diffusion rate and the dimensional sizes. In understanding the limitations, the growth of NiO nanotubes with suitably uniform tube walls by oxidation of nickel nanowires was demonstrated for the first time. The applications of NiO thin films and nanostructures were then investigated for resistive switching memory and electrochromic devices. For the NiO resistive switching memory, a filamentary switching mechanism was demonstrated. For applications in the electrochromic devices, the detailed coloration and degradation mechanisms of NiO were elucidated for the first time.
URI: http://scholarbank.nus.edu.sg/handle/10635/35858
Appears in Collections:Ph.D Theses (Open)

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