Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/35163
Title: Localized anneal
Authors: TAN, DEXTER
LIM, CHEE CHONG
YEONG, SAI HOOI
NG, CHEE MANG 
Issue Date: 18-Sep-2012
Source: TAN, DEXTER,LIM, CHEE CHONG,YEONG, SAI HOOI,NG, CHEE MANG (2012-09-18). Localized anneal. ScholarBank@NUS Repository.
Abstract: A method of forming a device is presented. The method includes providing a wafer having an active surface and dividing the wafer into a plurality of portions. The wafer is selectively processed by localized heating of a first of the plurality of portions. The wafer is then repeatedly selectively processed by localized heating of a next of the plurality of portions until all plurality of portions have been selectively processed.
URI: http://scholarbank.nus.edu.sg/handle/10635/35163
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