Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/34886
Title: Low work function metal alloy
Authors: YU HONGYU
JINGDE CHEN N. 
MINGFU LI N. 
KWONG DIM-LEE 
BIESEMANS SERGE
KITTL JORGE ADRIAN
Issue Date: 15-Aug-2007
Source: YU HONGYU,JINGDE CHEN N.,MINGFU LI N.,KWONG DIM-LEE,BIESEMANS SERGE,KITTL JORGE ADRIAN (2007-08-15). Low work function metal alloy. ScholarBank@NUS Repository.
Abstract: The present invention discloses low work function metals for use as gate electrode in nMOS devices. An alloy of lanthanide(s), metal and semiconductor is provided. In particular an alloy of Nickel-Ytterbium (NiYb) is used to fully silicide (FUSI) a silicon gate. The resulting Nickel-Ytterbium-Silicon gate electrode has a work function of about 4.22eV.
URI: http://scholarbank.nus.edu.sg/handle/10635/34886
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