Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/32605
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dc.titleMethod for low temperature lamination of metals to fluoropolymers
dc.contributor.authorKANG, EN TANG
dc.contributor.authorSHI, JIAN-LI
dc.contributor.authorNEOH, KOON GEE
dc.contributor.authorTAN, KUANG LEE
dc.contributor.authorCUI, CHENG QIANG
dc.contributor.authorLIM, THIAM BENG
dc.date.accessioned2012-05-02T02:27:41Z
dc.date.available2012-05-02T02:27:41Z
dc.date.issued2002-01-01
dc.identifier.citationKANG, EN TANG,SHI, JIAN-LI,NEOH, KOON GEE,TAN, KUANG LEE,CUI, CHENG QIANG,LIM, THIAM BENG (2002-01-01). Method for low temperature lamination of metals to fluoropolymers. ScholarBank@NUS Repository.
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/32605
dc.description.abstractThe present invention is directed to a method for the lamination of metals, and especially copper, to the surfaces of fluoropolymers at temperatures substantially below the sintering temperatures or melting temperatures of the fluoropolymers. More specifically, the invention is directed to a method for surface modification of fluoropolymers by thermal graft copolymerization with concurrent lamination of a metal (e.g. copper) in the presence of a functional monomer. The process can be carried out under atmospheric conditions and in the complete absence of an added polymerization initiator. The so-laminated fluoropolymer-metal interfaces exhibit T-peel strengths of no less than 8 N/cm and delaminate via cohesive failure inside the fluoropolymer.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/http://analytics.patsnap.com/patent_view/view?pn=US6334926
dc.sourcePatSnap
dc.typePatent
dc.contributor.departmentCHEMICAL & ENVIRONMENTAL ENGINEERING
dc.contributor.departmentCHEMICAL ENGINEERING
dc.contributor.departmentPHYSICS
dc.contributor.departmentINSTITUTE OF MICROELECTRONICS
dc.identifier.isiutNOT_IN_WOS
dc.description.patentnoUS6334926
dc.description.patenttypeGranted Patent
dc.contributor.patentassigneeNATIONAL UNIVERSITY OF SINGAPORE & INSTITUTE OF MICROELECTRONICS
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