Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/15386
DC Field | Value | |
---|---|---|
dc.title | Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices | |
dc.contributor.author | JOO MOON SIG | |
dc.date.accessioned | 2010-04-08T10:52:59Z | |
dc.date.available | 2010-04-08T10:52:59Z | |
dc.date.issued | 2006-06-22 | |
dc.identifier.citation | JOO MOON SIG (2006-06-22). Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices. ScholarBank@NUS Repository. | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/15386 | |
dc.description.abstract | In this thesis, firstly, a high quality MOCVD HfAlO dielectric film using a single cocktail liquid source as a new high-K fabrication method is demonstrated. The HfAlO film with 90% HfO2, which has minimum sacrifice of K value, shows a great improvement in thermal stability and the significant reduction of leakage current compared to pure HfO2 film. Secondly, it is found that the presence of silicon and its location at the interface plays a major role in thermal instability of effective work function of metal/high-K gate stack. Thirdly, it is found using the combination of semi-empirical approach and MIGS theory that FUSI gate has effectively MSi2 configuration at the gate dielectric interface. Lastly, it is found that there is a critical composition ratio (Ccrit) of Ni to Si in Ni-FUSI gate which starts to show a strong Fermi-level pinning and the Ccrit is dependent on the underlying gate dielectric material. | |
dc.language.iso | en | |
dc.subject | high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function | |
dc.type | Thesis | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.contributor.supervisor | CHO BYUNG-JIN | |
dc.description.degree | Ph.D | |
dc.description.degreeconferred | DOCTOR OF PHILOSOPHY | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Ph.D Theses (Open) |
Show simple item record
Files in This Item:
File | Description | Size | Format | Access Settings | Version | |
---|---|---|---|---|---|---|
JooMS_Thesis.pdf | 2.87 MB | Adobe PDF | OPEN | None | View/Download |
Google ScholarTM
Check
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.