Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/15253
Title: Optimization and Computer Control of the Sub-100 nm, Proton Beam Writing Facility at CIBA
Authors: CHAMMIKA N B UDALAGAMA
Keywords: Proton Beam Writing, Delta-rays, PMMA, Automatic Beam Focusing, Rapid Imaging, SU-8, Luminescence
Issue Date: 11-Apr-2006
Source: CHAMMIKA N B UDALAGAMA (2006-04-11). Optimization and Computer Control of the Sub-100 nm, Proton Beam Writing Facility at CIBA. ScholarBank@NUS Repository.
Abstract: The past decade has witnessed proton beam (p-beam) writing establishing itself as a lithographic technique with unparallel characteristics that is able to produce truly 3D, high aspect ratio nano/micro structures with smooth sidewalls of high verticality. The unveiling of the worlda??s first dedicated p-beam writer at CIBA and the numerous research projects based on p-beam writing ( micro-photonics, bio-applications, micro/nano fluidics. . . .) that are presently underway, bear testament to this fact. In view of this demand there has been much impetus into research and development of the technique, proton beam writing. The present research effort aims at achieving this via two distinct channels. The first involves furthering the understanding of p-beam writing via (1) an event by event Monte Carlo simulation of the physical processes at play and (2) by a simulation of the chemical resist development step. More specifically, the Monte Carlo simulation aims at recreating the energy deposition process in proton beam writing. Explicit attention is given to proton propagation, delta-ray generation, delta-ray propagation and energy deposition. The resist development simulation attempts to reproduce the progress of the etch front with time.The second mode of contribution involves technological enhancements aimed at making proton beam writing flexible, efficient and more importantly, more accessible to untrained individuals wishing to utilise p-beam writing. This involves (1) the incorporation of the AutoCAD standard, (2) the utilisation of luminescence for dose normalisation, (3) the development of a secondary electron rapid imaging system and (4) the introduction of an automatic focusing system for the focusing of MeV ions.
URI: http://scholarbank.nus.edu.sg/handle/10635/15253
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