Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/14950
Title: Improvement of mechanical properties of mesoporous ultra low_k thin films after NH3 plasma treatment
Authors: LI JINGHUI
Keywords: Porous Low-k, NH3 Plasma Treatment, Nano-indentation, Young’s Modulus, Hardness, Dense Surface Layer
Issue Date: 23-Nov-2005
Source: LI JINGHUI (2005-11-23). Improvement of mechanical properties of mesoporous ultra low_k thin films after NH3 plasma treatment. ScholarBank@NUS Repository.
Abstract: Porous low-k thin films are future inter-metal-layer materials for semiconductor manufacturing. However, there are some integration challenges in implementing porous low-k thin films because of their weak mechanical properties. The correlation between porosity and mechanical properties has been investigated by using nano-indentation technique and semi-empirical simulation analysis. The mechanical properties of porous low-k thin films can be improved by NH3 plasma treatment. The improvement of Younga??s modulus (E) and hardness (H) of porous low-k thin films after NH3 plasma treatment has been investigated by nano-indentation. From the curve of P/h versus h, we deduced that a thin dense surface layer formed without changing the whole structure and composition of the thin film. Evidences obtained from TEM, SIMS, and FTIR support the assumption of the formation of the thin dense layer.
URI: http://scholarbank.nus.edu.sg/handle/10635/14950
Appears in Collections:Master's Theses (Open)

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