Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/14864
Title: Tip sharpened methods for atomic force microscopy
Authors: WANG SHURUI
Keywords: AFM tip
Issue Date: 8-Jun-2005
Source: WANG SHURUI (2005-06-08). Tip sharpened methods for atomic force microscopy. ScholarBank@NUS Repository.
Abstract: ABSTRACTAtomic Force Microscopy (AFM) has grate potential as a tool for sub-micro structures of integrate circuit (IC) process. However, the poorly characterized silicon probe tips currently employed in AFM limit its application in sub-micron IC features. To meet the IC process requirements in AFM there is a need for the development of novel probes which fulfill the requirement of process control.Due to the AFM resolution is limited by the tip shape, the sharpened methods are studied in this thesis and the limitation of different AFM tips design is studies and analysis. The result show the FIB milling tip can achieve very high resolution.In this study, Dual-beam FIB has been used to sharpen the traditional silicon probes which radius level is about 20nm. Ion beam used to mill pattern and line. High energy Ion beam removed the silicon material that is in milling pattern. By using this sharpening procedure we created long high aspect ratio tip with about 5-10nm of the tip curvature. The aspect ratio of the tip is near 1: 200. The sharpened area is about 2-3 A?m. The tip angle is near 5Es. The milling tip has a smaller radius and high aspect ratio. FIB milling tip, standard tip and super tip is characterized by FE-SEM in FIB system. SEM images of tip provide the physical parameters of tip. The FIB milling tip was used to evaluated 0.5I?m silicon nitride (Si3N4) thin film layer and 0.7I?m copper (Cu) film.
URI: http://scholarbank.nus.edu.sg/handle/10635/14864
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