Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/14651
Title: Growth of PMN-PT thin film by pulsed laser deposition
Authors: ZHONG XIANGLI
Keywords: Pulsed Laser Deposition, Thin Film, LaNiO3, 0.65Pb(Mg1/3Nb2/3)O3-0.35PbTiO3, LaAlO3, SiO2/Si
Issue Date: 12-May-2005
Source: ZHONG XIANGLI (2005-05-12). Growth of PMN-PT thin film by pulsed laser deposition. ScholarBank@NUS Repository.
Abstract: 0.65Pb(Mg1/3Nb2/3)O3-0.35PbTiO3 thin films (PMN-PT) on LaNiO3 (LNO) metallic oxide electrode were successfully deposited using pulsed laser deposition technique. LaAlO3 (LAO), SiO2/Si and Pt/Ti/Si were employed as substrates. By controlling the operating parameters, high quality films with epitaxial growth and with preferred orientation growth of PMN-PT were successfully fabricated on LAO and SiO2/Si substrates respectively. The successful selection of LNO as both electrode and buffer layer is effective on eliminating the pyrochlore phase as compared to Pt. LNO also promotes preferred orientation growth of PMN-PT. XRD, FE-SEM, TEM, AFM, SIMS were used for structural characterization. Mechanical properties of the PMN-PT film were studied using nano-indentation technique and ferroelectric properties were characterized by a ferroelectric tester.
URI: http://scholarbank.nus.edu.sg/handle/10635/14651
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