Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/137730
Title: DEVELOPMENT AND OPTIMIZATION OF HIGH BRIGHTNESS NANO-APERTURE ION SOURCE FOR PROTON BEAM WRITING APPLICATIONS
Authors: XU XINXIN
ORCID iD:   orcid.org/0000-0001-9131-0693
Keywords: Nano-aperture ion source, high brightness, proton beam writing, lithography, sub-10 nm
Issue Date: 25-Aug-2017
Source: XU XINXIN (2017-08-25). DEVELOPMENT AND OPTIMIZATION OF HIGH BRIGHTNESS NANO-APERTURE ION SOURCE FOR PROTON BEAM WRITING APPLICATIONS. ScholarBank@NUS Repository.
Abstract: Proton beam writing (PBW) is a direct-write lithographic technique employing focused protons, for fabricating three-dimensional nano-structures. Currently, the performance of PBW is limited by low brightness ~20 A/(m2srV) of the radio frequency ion source. Nano-aperture ion source (NAIS) is a potential candidate for a sub-10 nm proton beam writing (PBW) system. Simulation was conducted and predicted that a brightness of > 106 A/(m2srV) can be delivered by NAIS. Prototype and modified sources were designed and successively micro-fabricated. The reduced brightness was obtained to be ~104 A/(m2srV) for an Ar+ beam. For further improving the performance of NAIS, the new NAIS design to avoid bulge of ionization chamber was evaluated and simulated. Equipping with the NAIS, a low energy proton microscope was proposed and examined. A compact PBW system was designed and examined, with the ability to achieve sub-10 nm resolution with comparable writing speed to electron beam lithography.
URI: http://scholarbank.nus.edu.sg/handle/10635/137730
Appears in Collections:Ph.D Theses (Open)

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