Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/13463
Title: Run-to-run control in semiconductor manufacturing
Authors: VARADARAJAN GANESH KUMAR
Keywords: RUN-TO-RUN, CMP, SEMICONDUCTOR MANUFACTURING, APC, EWMA, ADAPTIVE CONTROL
Issue Date: 8-Nov-2003
Source: VARADARAJAN GANESH KUMAR (2003-11-08). Run-to-run control in semiconductor manufacturing. ScholarBank@NUS Repository.
Abstract: Semiconductor manufacturing processes like chemical mechanical polishing (CMP) and photolithography has become an indispensable processing module used in fabrication facilities worldwide. The lack of in-situ measurements of the product qualities of interest, in this case, the surface thickness uniformity, makes run-to-run control the only viable scheme in most semiconductor manufacturing processes. The literature contains many variations of run-to-run control schemes to control the CMP process. In this thesis, we analyze the performance of these run-to-run control schemes and propose a self-tuning predictor-corrector controller (PCC). A 25% improvement in performance is observed in comparison with the other schemes.
URI: http://scholarbank.nus.edu.sg/handle/10635/13463
Appears in Collections:Master's Theses (Open)

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