Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/13143
Title: Application of deep ultraviolet lithography in magnetic nanostructures
Authors: SINGH NAVAB
Keywords: Deep Ultraviolet Lithograpgy, Phase shift mask, Magnetic nanostructures
Issue Date: 3-Jun-2008
Source: SINGH NAVAB (2008-06-03). Application of deep ultraviolet lithography in magnetic nanostructures. ScholarBank@NUS Repository.
Abstract: Deep Ultraviolet (DUV) lithography is attempted for the fabrication of magnetic nanostructures in various shapes and sizes over a large area, allowing the characterization of magnetic properties using conventional magnetometers. Solutions are developed to overcome the issues caused by fabrication challenges in implementing strong phase shift masks (PSMs). Comprehensive investigation of the relationship between swing amplitude and pattern size using alternating PSM lithography is presented. Double patterning and double exposure with shifts are implemented for density improvement and shape manipulation of magnetic nanostructures. Nanofabrication process beyond the conventional limits of DUV is developed to fabricate sub-50nm magnetic nanostructures using silicon templates. In addition, a detailed and systematic investigation of magnetic spin states evolution, in-plane anisotropy and magnetostatic interaction in arrays of elongated Ni80Fe20 rings and their derivatives is presented. A comprehensive investigation of the spin states and shape anisotropy in magnetic anti-dot mesostructures in complex shapes such as elongated anti-ring, anti-U and anti-C, is also presented.
URI: http://scholarbank.nus.edu.sg/handle/10635/13143
Appears in Collections:Ph.D Theses (Open)

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