Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/13045
Title: Atomic force microscopy (AFM) based nanopatterning and nanocharacterization
Authors: CHUNG HONG JING
Keywords: Atomic force microscopy, nanopatterning, nanocharacterization, bias-assisted, force-assisted, cAFM
Issue Date: 21-Feb-2008
Source: CHUNG HONG JING (2008-02-21). Atomic force microscopy (AFM) based nanopatterning and nanocharacterization. ScholarBank@NUS Repository.
Abstract: Extensive works have been carried out on the development of AFM nanolithography for structuring and fabrication in recent years. The many AFM nanolithographic techniques can be generally classified into (i) force-assisted and (ii) bias-assisted nanolithography on the basis of their mechanistic and operational principles. Force-assisted AFM nanolithography includes mechanical indentation and plowing, thermomechanical writing, manipulation and dip-pen nanolithography. Bias-assisted AFM nanolithography encompasses probe anodic oxidation, field evaporation, electrochemical deposition and modification, electrical cutting and nicking, electrostatic deformation and electrohydrodynamic nanofluidic motion, nanoexplosion and shock wave generation, and charge deposition and manipulation. The scope of this thesis covers different nanofabrication techniques in the bias-assisted AFM nanolithography. We focus on the understanding of AFM nanooxidation on semiconductor surfaces (silicon and silicon carbide), the studies of patterning on polymer surfaces and finally, a discussion on the thin liquid assisted manipulation and structuring techniques. It is our hope that the various methods described in this thesis may contribute more insights to the development and understanding of the probe-based nanopatterning research.
URI: http://scholarbank.nus.edu.sg/handle/10635/13045
Appears in Collections:Ph.D Theses (Open)

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