Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/122314
Title: DEVELOPMENT OF AN ELECTRON IMPACT GAS ION SOURCE FOR PROTON BEAM WRITING APPLICATIONS
Authors: LIU NANNAN
Keywords: Ion source, electron and ion optics, high brightness, ion lithography, microfabrication
Issue Date: 30-Sep-2015
Source: LIU NANNAN (2015-09-30). DEVELOPMENT OF AN ELECTRON IMPACT GAS ION SOURCE FOR PROTON BEAM WRITING APPLICATIONS. ScholarBank@NUS Repository.
Abstract: A high brightness electron impact gas ion source has been developed in this thesis. This ion source can create ions from a miniature ionization chamber with small virtual source sizes, typically =100 nm. Direct ray tracing simulations including Coulomb effects predict that the source reduced brightness is 10^6 ? 10^7 A/m2SreV, over 10^5 times better than the RF ion source currently used in single-ended MeV accelerators. A prototype of this ion source was successively micro-fabricated using Integrated Circuit Technology. Preliminary source characterization experiments were performed inside a Field Emission Scanning Electron Microscope. The total output ion current using argon gas was measured to be 300 pA. The estimated reduced brightness was found to be comparable to the injecting electron beam reduced brightness. This leads to the design of a compact proton beam lithography, with sub-10 nm writing feature, and writing speed comparable to Electron Beam Lithography.
URI: http://scholarbank.nus.edu.sg/handle/10635/122314
Appears in Collections:Ph.D Theses (Open)

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