Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/118575
Title: The 2nd generation proton beam writing
Authors: YAO YONG
Keywords: proton beam writing,high aspect ratio,lithography,resolution standard,automatic focusing, sub-10 nm
Issue Date: 18-Aug-2014
Source: YAO YONG (2014-08-18). The 2nd generation proton beam writing. ScholarBank@NUS Repository.
Abstract: Proton beam writing (PBW) has the ability to fabricate high aspect ratio 3D micro/nano-structures with precise edges, smooth and straight side-walls. The newly developed 2nd generation PBW line has a very high lens demagnification (857 ? 130). An orthogonal free-standing grid with high side wall verticality has been made and used to focus down the proton beam. An automatic focusing program based on LabVIEW was made, which can focus 2MeV proton down to 9.3 nm ? 32 nm in less than 10 minutes. Fine lithographic HSQ patterns featuring 19 nm line width and 60 nm spacing have been fabricated using the 2nd generation PBW line.
URI: http://scholarbank.nus.edu.sg/handle/10635/118575
Appears in Collections:Ph.D Theses (Open)

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