Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3054181
Title: A broadband permeability measurement of FeTaN lamination stack by the shorted microstrip line method
Authors: Chen, X.
Ma, Y. 
Xu, F. 
Wang, P. 
Ong, C.K. 
Issue Date: 2009
Source: Chen, X., Ma, Y., Xu, F., Wang, P., Ong, C.K. (2009). A broadband permeability measurement of FeTaN lamination stack by the shorted microstrip line method. Journal of Applied Physics 105 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3054181
Abstract: In this paper, the microwave characteristics of a FeTaN lamination stack are studied with a shorted microstrip line method. The FeTaN lamination stack was fabricated by gluing 54 layers of FeTaN units with epoxy together. The FeTaN units were deposited on both sides of an 8 μm polyethylene terephthate (Mylar) film as the substrate by rf magnetron sputtering. On each side of the Mylar substrate, three 100-nm FeTaN layers are laminated with two 8 nm Al 2O3 layers. The complex permeability of FeTaN lamination stack is calculated by the scattering parameters using the shorted load transmission line model based on the quasi-transverse-electromagnetic approximation. A full wave analysis combined with an optimization process is employed to determine the accurate effective permeability values. The optimized complex permeability data can be used for the microwave filter design. © 2009 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/116900
ISSN: 00218979
DOI: 10.1063/1.3054181
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