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https://doi.org/10.1149/1.2986861
Title: | Enhanced ferromagnetic Fe-rich germanide film grown using magnetron sputtering employing a post-deposition anneal | Authors: | Wong, A.S.W. Ho, G.W. Chia, D.Z. |
Issue Date: | 2008 | Citation: | Wong, A.S.W., Ho, G.W., Chia, D.Z. (2008). Enhanced ferromagnetic Fe-rich germanide film grown using magnetron sputtering employing a post-deposition anneal. ECS Transactions 16 (10) : 989-997. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2986861 | Abstract: | We describe the formation of a ferromagnetic Fe-rich germanide layer by a two-step process involving magnetron sputtering and anneal. A thin epitaxial iron (epi-Fe) film is deposited on Ge (001) substrate and then annealed at 275 °C in nitrogen inducing germanide formation. Surprisingly, we observe an enhancement in saturation magnetization in germanide films. Secondary ion mass spectroscopy and x-ray diffraction confirm the formation of a thin Fe-rich germanide layer whilst high resolution transmission suggest that it can be Fe3Ge. ©The Electrochemical Society. | Source Title: | ECS Transactions | URI: | http://scholarbank.nus.edu.sg/handle/10635/114556 | ISBN: | 9781566776561 | ISSN: | 19385862 | DOI: | 10.1149/1.2986861 |
Appears in Collections: | Staff Publications |
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