Please use this identifier to cite or link to this item:
|Title:||Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation|
Radiation by moving charges
|Source:||Dattoli, G., Doria, A., Gallerano, G.P., Giannessi, L., Hesch, K., Moser, H.O., Ottaviani, P.L., Pellegrin, E., Rossmanith, R., Steininger, R., Saile, V., Wüst, J. (2001-12-11). Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 474 (3) : 259-272. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-9002(01)00887-7|
|Abstract:||The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 or 11.3nm radiation, respectively). The requirements are: 50 W, 2%, bandwidth and minimal power outside this bandwidth. Three options were investigated. The first two deal with radiation from bending magnets and undulators. The results confirm the earlier work by Oxfords Instrument and others that these light sources lack in-band power while emitting excessive out-of-band radiation. The third approach is a Free Electron Laser (FEL) driven by a 500MeV linear accelerator with a superconducting mini-undulator as radiation emitting device. Such as device would produce in-band EUV-power in excess of 50W with negligible out-of-band power. © 2001 Elsevier Science B.V. All rights reserved.|
|Source Title:||Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Mar 7, 2018
WEB OF SCIENCETM
checked on Jan 29, 2018
checked on Mar 11, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.