Please use this identifier to cite or link to this item:
|Title:||The study of bonding composition of CNx film by thermal degradation method|
|Keywords:||A. Chemically modified carbons|
B. Plasma sputtering
C. Thermodynamic analysis
D. Reaction kinetics
|Source:||Zhang, L.H.,Gong, H.,Li, Y.Q.,Wang, J.P. (2004). The study of bonding composition of CNx film by thermal degradation method. Carbon 42 (3) : 537-545. ScholarBank@NUS Repository. https://doi.org/10.1016/j.carbon.2003.12.036|
|Abstract:||Dynamic thermal degradation of amorphous carbon nitride (a-CNx) thin films was studied in N2 and air. The films were magnetron-sputtered at two different pressures to yield various C-C and C-N ratios. Typically, the films consist of interstitial and weakly-bonded carbon-nitrogen molecules or clusters and nitrogen-substituted graphitic-carbons. The carbon and nitrogen atoms are mainly bonded in sp, sp2 and sp3 configurations that may contain N charged defects. The relative amount of nitrogen-substituted graphitic-carbons is significantly increased with plasma energy. The decomposition generally occurs in two steps. The first, initiating at ∼200 °C in air and with apparent activation energy (Ea) of ∼ 111 kJ/mol, relates to the oxidation and release of interstitial and weakly-bonded carbon-nitrogen molecules. The second, starting at ∼520 °C and having Ea of ∼140 kJ/mol, can be ascribed to the dissociation of nitrogen-substituted graphitic-carbons. © 2003 Elsevier Ltd. All rights reserved.|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 20, 2018
checked on Feb 23, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.