Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.carbon.2003.12.036
Title: The study of bonding composition of CNx film by thermal degradation method
Authors: Zhang, L.H.
Gong, H. 
Li, Y.Q.
Wang, J.P.
Keywords: A. Chemically modified carbons
B. Plasma sputtering
C. Thermodynamic analysis
D. Reaction kinetics
Issue Date: 2004
Citation: Zhang, L.H.,Gong, H.,Li, Y.Q.,Wang, J.P. (2004). The study of bonding composition of CNx film by thermal degradation method. Carbon 42 (3) : 537-545. ScholarBank@NUS Repository. https://doi.org/10.1016/j.carbon.2003.12.036
Abstract: Dynamic thermal degradation of amorphous carbon nitride (a-CNx) thin films was studied in N2 and air. The films were magnetron-sputtered at two different pressures to yield various C-C and C-N ratios. Typically, the films consist of interstitial and weakly-bonded carbon-nitrogen molecules or clusters and nitrogen-substituted graphitic-carbons. The carbon and nitrogen atoms are mainly bonded in sp, sp2 and sp3 configurations that may contain N charged defects. The relative amount of nitrogen-substituted graphitic-carbons is significantly increased with plasma energy. The decomposition generally occurs in two steps. The first, initiating at ∼200 °C in air and with apparent activation energy (Ea) of ∼ 111 kJ/mol, relates to the oxidation and release of interstitial and weakly-bonded carbon-nitrogen molecules. The second, starting at ∼520 °C and having Ea of ∼140 kJ/mol, can be ascribed to the dissociation of nitrogen-substituted graphitic-carbons. © 2003 Elsevier Ltd. All rights reserved.
Source Title: Carbon
URI: http://scholarbank.nus.edu.sg/handle/10635/107239
ISSN: 00086223
DOI: 10.1016/j.carbon.2003.12.036
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