Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.200400392
DC FieldValue
dc.titleObservation of field-effect transistor behavior at self-organized interfaces
dc.contributor.authorChua, L.-L.
dc.contributor.authorHo, P.K.H.
dc.contributor.authorSirringhaus, H.
dc.contributor.authorFriend, R.H.
dc.date.accessioned2014-10-29T08:40:08Z
dc.date.available2014-10-29T08:40:08Z
dc.date.issued2004-09-16
dc.identifier.citationChua, L.-L., Ho, P.K.H., Sirringhaus, H., Friend, R.H. (2004-09-16). Observation of field-effect transistor behavior at self-organized interfaces. Advanced Materials 16 (18) : 1609-1615. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.200400392
dc.identifier.issn09359648
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/107147
dc.description.abstractThe method of self-organization used for manufacturing field-effect transistors (FET), was investigated. Low-voltage polymer FETs based on poly(9,9-dialkylfluorene-alt-triarylmine) was used as the p-channel semiconductor, and a 40-60 nm thick crosslinked bisbenzocyclobutene derivative (BCB) was used as the gate dielectric. As the gate dielectric was crosslinked to a network polymer, it was found to integrate with subsequent solvent and thermal processing steps for complex circuits. The results show that this technique produces interfaces which allows to probe the dependence of field-effect mobility on interface microroughness.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/adma.200400392
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1002/adma.200400392
dc.description.sourcetitleAdvanced Materials
dc.description.volume16
dc.description.issue18
dc.description.page1609-1615
dc.description.codenADVME
dc.identifier.isiut000224816100006
Appears in Collections:Staff Publications

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