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|Title:||Novel fiducial grid for X-ray masks|
|Citation:||Soo, C.P.,Chandra, S.,Kong, J.R.,Bourdillon, A.J.,Lu, B. (1999). Novel fiducial grid for X-ray masks. Proceedings of SPIE - The International Society for Optical Engineering 3676 (I) : 63-69. ScholarBank@NUS Repository.|
|Abstract:||Novel methods to produce fiducial grids to feedback reference signal to the electron beam writer, including a fiducial grid to be copied to each level by deep UV or X-ray lithography, are investigated. With fiducial grid, the error budget for the image placement is reduced to that required for the first level of deep UV lithography mix and match such as 52 nm for 250 nm generation. The benefit in registration is greater for succeeding generations.|
|Source Title:||Proceedings of SPIE - The International Society for Optical Engineering|
|Appears in Collections:||Staff Publications|
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