Mo and W doping effects on CoCrPt thin films

Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0928-4931(01)00279-X

Title:	Mo and W doping effects on CoCrPt thin films
Authors:	Jin, D. Wang, J.P. Han, Q. Gong, H.
Keywords:	Coercivity Doping Mo S* Segregation W
Issue Date:	20-Oct-2001
Citation:	Jin, D., Wang, J.P., Han, Q., Gong, H. (2001-10-20). Mo and W doping effects on CoCrPt thin films. Materials Science and Engineering C 16 (1-2) : 75-79. ScholarBank@NUS Repository. https://doi.org/10.1016/S0928-4931(01)00279-X
Abstract:	Mo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (Hc) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed. © 2001 Elsevier Science B.V. All rights reserved.
Source Title:	Materials Science and Engineering C
URI:	http://scholarbank.nus.edu.sg/handle/10635/107125
ISSN:	09284931
DOI:	10.1016/S0928-4931(01)00279-X
Appears in Collections:	Staff Publications

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