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|Title:||Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates|
|Keywords:||Anodic oxide film growth|
EIS and XPS
|Citation:||Huang, Y.Z., Blackwood, D.J. (2005-11-25). Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates. Electrochimica Acta 51 (6) : 1099-1107. ScholarBank@NUS Repository. https://doi.org/10.1016/j.electacta.2005.05.051|
|Abstract:||The nature of the anodic oxide film that forms on titanium on titanium in 0.9% NaCl has been investigated using a wide range of techniques. A linear relationship was found between the critical current density required for passivation of titanium in 0.9% NaCl and the sweep rate. Anodic oxide films formed on titanium in 0.9% NaCl appear to consist of two layers, an inner compact layer, the growth of which continues to follow a high field growth law, and a porous less protective outer porous layer. XPS and XRD indicated that passive films on titanium consist mainly of TiO2. However, hydroxides and lower oxides are also present, especially in rapidly grown films. XRD data indicated that in 0.9% NaCl the anodic oxide film is formed through the preferential removal atoms in the plane of (0 0 2) in the course of electrochemical reaction. A model based analysis XPS spectra was proposed to explain the growth rate dependence of the degree of protection offered by anodic oxide films on titanium. XPS clearly demonstrated the present of Ti(III) and Ti(II) cations in the passive film. This is strong evidence that cation migration more likely dominates over anion migration in the growth mechanism of anodic oxide film. XPS data also revealed that the concentrations of Ti(III) and Ti(II) species within the oxide films increased as the oxide/metal interface was approached. © 2005 Elsevier Ltd. All rights reserved.|
|Source Title:||Electrochimica Acta|
|Appears in Collections:||Staff Publications|
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