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BRAM HOEX

rp02267

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Full Name
BRAM HOEX
(not current staff)
Variants
Hoex, B.
Hoex, Bram
 
Main Affiliation
 
Faculty
 
Email
serbh@nus.edu.sg
 

Publications

Results 1-20 of 34 (Search time: 0.006 seconds).

Issue DateTitleAuthor(s)
120150.4% absolute efficiency increase for inline-diffused screen-printed multicrystalline silicon wafer solar cells by non-acidic deep emitter etch-backPRABIR KANTI BASU ; Law, Felix; Shanmugam, Vinodh ; Kumar, Avishek V Joshi ; Richter, Paul J; Bottari, Frank J; Hoex, Bram 
231-Oct-2013Accurate characterization of thin films on rough surfaces by spectroscopic ellipsometrySiah, S.C.; Hoex, B. ; Aberle, A.G. 
32015Accurate extraction of the series resistance of aluminum local back surface field silicon wafer solar cellsChen, Jia; Du, Zheren ; Ma, Fajun ; Lin, Fen ; Sarangi, Debajyoti ; Hoex, Bram ; Aberle, Armin Gerhard 
47-Sep-2013Deposition temperature independent excellent passivation of highly boron doped silicon emitters by thermal atomic layer deposited Al2O 3Liao, B.; Stangl, R.; Ma, F. ; Hameiri, Z.; Mueller, T.; Chi, D.; Aberle, A.G. ; Bhatia, C.S. ; Hoex, B. 
52013Direct laser doping of poly-silicon thin films via laser chemical processingVirasawmy, S. ; Palina, N.; Widenborg, P.I. ; Kumar, A.; Dalapati, G.K.; Tan, H.R.; Tay, A.A.O. ; Hoex, B. 
65-Nov-2012Enhancement of laser-induced rear surface spallation by pyramid textured structures on silicon wafer solar cellsDu, Z.R.; Palina, N.; Chen, J.; Aberle, A.G. ; Hoex, B. ; Hong, M.H. 
7Jun-2013Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactorDuttagupta, S.; Lin, F. ; Shetty, K.D.; Aberle, A.G. ; Hoex, B. 
825-Sep-2013Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activationLiao, B.; Stangl, R.; Ma, F. ; Mueller, T.; Lin, F. ; Aberle, A.G. ; Bhatia, C.S. ; Hoex, B. 
9Oct-2012Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacksLin, F. ; Duttagupta, S.; Shetty, K.D.; Boreland, M.; Aberle, A.G. ; Hoex, B. 
102014Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell applicationDuttagupta, S.; Ma, F.-J. ; Hoex, B. ; Aberle, A.G. 
1123-Dec-2013Extracting physical properties of arbitrarily shaped laser-doped micro-scale areas in semiconductorsHeinrich, M.; Kluska, S.; Hameiri, Z.; Hoex, B. ; Aberle, A.G. 
122014Geometric confinement of directly deposited features on hydrophilic rough surfaces using a sacrificial layerLiu, L.; Wang, X.; Lennon, A.; Hoex, B. 
1328-Jul-2013Identification of geometrically necessary dislocations in solid phase crystallized poly-SiLaw, F.; Yi, Y.; Hidayat; Widenborg, P.I. ; Luther, J. ; Hoex, B. 
1428-Jul-2013Identification of geometrically necessary dislocations in solid phase crystallized poly-SiLaw, F.; Yi, Y.; Hidayat; Widenborg, P.I. ; Luther, J. ; Hoex, B. 
1531-May-2010Influences of oxygen contamination on evaporated poly-Si thin-film solar cells by solid-phase epitaxyHe, S.; Wong, J.; Inn, D.; Hoex, B. ; Aberle, A.G. ; Sproul, A.B.
167-Jun-2013Integration of β-FeSi2 with poly-Si on glass for thin-film photovoltaic applicationsKumar, A.; Dalapati, G.K.; Hidayat, H.; Law, F.; Tan, H.R.; Widenborg, P.I. ; Hoex, B. ; Tan, C.C.; Chi, D.Z.; Aberle, A.G. 
17Dec-2012Investigation of defect luminescence from multicrystalline Si wafer solar cells using X-ray fluorescence and luminescence imagingPeloso, M.P.; Palina, N.; Banas, K. ; Banas, A. ; Hidayat, H.; Hoex, B. ; Breese, M.B.H. ; Aberle, A.G. 
182013Investigation of screen-printed rear contacts for aluminum local back surface field silicon wafer solar cellsChen, J.; Tey, Z.H.J.; Du, Z.R.; Lin, F. ; Hoex, B. ; Aberle, A.G. 
1930-Jun-2012Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:HLaw, F.; Hoex, B. ; Wang, J. ; Luther, J. ; Sharma, K.; Creatore, M.; Van De Sanden, M.C.M.
202013Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide filmsLin, F. ; Hoex, B. ; Koh, Y.H.; Lin, J. ; Aberle, A.G.